The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Three targets magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, this three targets magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Three targets NST magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

ORGANIC AND INORGANIC EVAPORATION COATER adopts linear structure and is mainly composed of two organic material growth chambers which are connected by gate valves. One of the two growth Chambers is reserved for the butt joint interface with the glove box, which can complete the transfer of substrates between two independent film preparation systems. The organic material growth chamber mainly consists of vacuum chamber assembly, organic evaporation source, thermal resistance evaporation boat, sample transfer device, sample platform, film thickness monitor, vacuum chamber lighting device, baking device and so on.

NST PLASMA MAGNETRON SPUTTERING COATER is an excellent and cost effective coater for coating thin film of non-conductive material in RF plasma magnetron sputtering coater is small in size, occupies less laboratory space, simple in operation and widely used. Therefore, it is widely used in the laboratories of major universities and research institutes.

PROGRAMMABLE SINGLE CHAMBER MAGNETRON SPUTTERING COATER is a single-chamber structure, mainly composed of sputtering vacuum chamber, magnetron sputtering target, ion bombardment, revolution substrate, optical heating system, sputtering power supply, working gas path, vacuum acquisition system, installation machine, vacuum measurement, water cooling, alarm system and control system,etc.

The system is controlled by IPC and PLC, with two modes of automatic and manual control. In addition to put the sample, all other processes are realized on the touch screen. It provides man-machine operation interface such as vacuum system, sputtering process setting, filling and venting system, etc. On the IPC, you can set parameters through the formula, to implement the procedure process and equipment parameter Settings.

Magnetron Sputter coater

SINGLE CHAMBER MAGNETRON SPUTTERING SYSTEM is used for the preparation of novel thin film materials such as nanometer single-layer and multi-layer functional film, hard film, metal film, semiconductor film and dielectric film. It can be widely used in the research of thin film materials and the production of small batch. It can be widely used in universities and colleges, scientific research institutes of thin film materials preparation research and small batch.

TWO IN ONE FILM COATER can meet the requirements of the surface of the scanning electron microscope sample for spraying gold, steaming gold or carbon evaporating, and the production of experimental electrodes for non-conductor materials, and can also be used for the experiments of various new materials in material research.The machine is small in size, saves laboratory space, easy to operate, easy to clean, suitable for beginners, especially suitable for use in laboratories, research institutes, and laboratories of various universities.

TWO ZONES CSS FURNACE WITH ROTATING WAFER HOLDER is heated by two group of halogen heaters (Top and Bottom) separately with max. 10ºC/s heating rate. The top sample holder is rotatable to achieve high uniformity coating. It is an excellent tool to research new generation thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.

NST VACUUM MAGNETRON SPUTTERING SYSTEM is used for the preparation of novel thin film materials such as nanometer single-layer and multi-layer functional film, hard film, metal film, semiconductor film and dielectric film. It can be widely used in the research and production of thin film materials in colleges and universities.

NST 3 HEADS COMPACT RF PLASMA MAGNETRON SPUTTERING COATER is mainly used to make non-conductive films, especially some oxide films.It is the most cost-effective coater for researching in the new generation of oxide thin films.

NST-IN-LINE MAGNETRON SPUTTERING SYSTEM mainly consists of a loading sample chamber, a sputtering chamber, a output sample chamber, a substrate transfer mechanism, a pumping and vacuum measuring system, a gas circuit system, an electronic control system, and a mounting base. In addition, after the system is upgraded, it would be a 5 chamber structure: the loading sample chamber, 3 independent sputtering chambers, output sample chamber; Rf power supply is added to provide the function of preparing dielectric film and realize continuous coating.

DUAL-TARGET MAGNETRON SPUTTERING COATER is equipped with two 300W power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Dual-target magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

ULTRA-HIGH VACUUM THERMAL EVAPORATION COATER is equipped with 4 evaporation heating boats, each of which can be independently evaporation coating.There is a rotatable baffle above the heating boat. When one of the heating boats is working,the baffle will cover the other three tungsten boats to prevent contamination of the vapor deposition materials.If the partial configuration is changed, the evaporation coating of the organic material can be realized, which can meet the research requirements of the light-emitting device and the organic solar battery, and it is an experimental device with an ideal coating effect and high cost performance.