NST-3 Heads Compact RF Plasma Magnetron Sputtering Coater

1 Piece (MOQ)

Business Type Manufacturer, Exporter, Supplier
Brand Name NST
Material Mild Steel
Finishing Polished
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Preferred Buyer From

Location Anywhere in India

Product Details

Driven Type
ISO 9001:2015
Packaging Type
Wooden Box
Rust Proof, Long Life, High Performance, Easy To Operate
Single Phase
1 Year
Country of Origin
540 mm L×540 mm W×1000 mm H
Net Weight
60 Kg
Payment Terms
L/C, T/T, Western Union

NST 3 HEADS COMPACT RF PLASMA MAGNETRON SPUTTERING COATER is mainly used to make non-conductive films, especially some oxide films.It is the most cost-effective coater for researching in the new generation of oxide thin films.

Yes! I am interested

Technical Specifications

Input Power Single phase 220 VAC, 50 / 60 Hz
1000 W (including vacuum pump and water chiller)
If the voltage is 110 V, a 1500 W transformer can be ordered at our company
Power Source 13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads
Load range: 0 – 80 Ω adjustable. Tuning range: -200j – 200j adjustable
The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” (no breaking of vacuum and plasma during a multilayer process)
With a DC power supply, the coater can be easily modified into 1” DC sputtering sources for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations
Magnetron Sputtering Head Three 1″ magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps
One manually operated shutter is built on the flange
One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads
Sputtering Target Target size requirement: 1″ diameter×1/8″ thickness max
Sputtering distance range: 50 – 80 mm adjustable
Sputtering angle range: 0 – 25° adjustable
1″ diameter Cu target and Al2O3 target are included for demo testing
Vacuum Chamber Vacuum chamber: 256 mm OD×238 mm ID×276 mm Height, made of high purity quartz
Sealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone O-ring
Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber
Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber baking
Sample Holder Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover
Sample holder size: 50 mm Dia. for. 2″ wafer max
Rotation speed: 1-10 rpm adjustable for uniform coating
The holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature controller
Vacuum Pump KF40 vacuum port is built in for connecting to a vacuum pump.
Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump

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