Oxygen Plasma Cleaner

Technical parameters:

Chamber material : High purity quartz

Chamber size : Diameter 150 mm; Length 270 mm

RF power supply

Power supply features

The power supply is an all-solid-state RF power supply, and adopts a high-stability and high-reliability power amplifier module and a DC module, which effectively ensures the RF power output of the power supply. High quality electronic components are used to ensure the reliability of the products.

Power advantage

1. Long time normal operation. 2. Simple and flexible operation. 3. High power supply efficiency and low heat generation. 4. With perfect reflection power protection function.

RF power: 0~100W/300W/500W/1000W continuously adjustable

RF connector : N type connector

Signal frequency : 40KHz/13.56MHz ±0.005%

Machine efficiency : ≥75%

Reflected power : ≤100W

Harmonic component : ≤-50 dB

Power stability : ±0.1%

cooling method : Forced air cooling

Gas measurement : Measuring unit

Float flowmeter :

A channel range :10～ 100ml

Gas channel :Two channels

B channel range :16～ 160ml

Vacuum Measurement : Digital vacuum gauge (resistance gauge) display on HMI

Motor noise :≤56dB

Vacuum pump : Two-stage rotary vane vacuum pump

Pipe interface :

Gas inlet: KF16 exhaust port KF16

Motor Power : 230V 50 Hz: Single Phase

Connecting pipe :KF16 vacuum bellows

Pumping rate : 50 Hz: 15m3/hr; 250 LPM

Vacuum valve : Solenoid valve

Vacuum range : 0.001mbar～1024 mbar

Motor Power : 400W

Ultimate vacuum : 0.001 mbar

Other 

Power supply : AC220V 50/60Hz

Working vacuum : ≤40Pa

Total power : 550W/600W

Overall size : 600mm×500mm×560mm

Operating temperature : -10℃ - 40℃

Total Weight : 80kg (with packaging)

The High Quality Plasma Surface Treatment Equipment is designed for semiconductor surface modification, offering purification, activation, coarsening, etching, and grafting. It features a 110L chamber, Mg-Al vacuum chamber material, and supports multiple treatment gases like O2, Ar, N2, H2, CF4, and CDA. Equipped with a Siemens PLC system, Schneider electrical system, and ULVAC vacuum gauge, it ensures high stability, low energy consumption, and long service life. The dry treatment process eliminates pollution, making it eco-friendly. Optional configurations include RF Generator and customizable vacuum chamber size.

The Plasma Surface Treatment Machine is designed for surface activation and cleaning of plastic, metal, and chips. It features a 130L chamber, supports multiple treatment gases (O2, Ar, N2, H2, CF4, CDA), and includes a Siemens PLC system, Schneider electrical system, and a 10.7-inch touch screen. It ensures dry, low-temperature processing, making it ideal for heat-sensitive materials, and offers high stability with low energy consumption and maintenance costs. Optional configurations include an RF generator and customizable vacuum chamber sizes.

The NST Series Vacuum Plasma Cleaner is designed for surface purification, activation, coarsening, etching, and grafting, suitable for treating polymers, metals, and semiconductors. It features a 25L chamber, 13.56MHz RF power supply with auto-matching, precise gas control via Horiba Mass Flow Controller, and a PLC control system by Siemens. Advantages include dry treatment processes, low-temperature operation for heat-sensitive materials, high stability, long service life, and low energy consumption.

NST 5L plasma cleaner can change the surface properties of some materials according to the needs under certain conditions. During the cleaning process, the glow discharge of the small

THE ROLE OF PLASMA CLEANING

THE PRINCIPLE OF PLASMA CLEANING IS MAINLY:

ETCHING ON THE SURFACE OF THE MATERIAL – PHYSICAL EFFECT

A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals, act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect to roughen the surface of the sample and form many fine pits, which increases the specific surface of the sample,improves the wetting properties of solid surfaces.

Activation bond energy, cross-linking

The energy of the particles in the plasma is between 0 and 20 eV, and most of the bond energy in the polymer are between 0 and 10 eV. Therefore, after the plasma acts on the solid surface, the original chemical bond on the solid surface can be broken. Free radicals in the plasma form a network of crosslinked structures with these bonds, greatly activating surface activity.

Formation of new functional groups – chemical action

If a reactive gas is introduced into the electric discharge gas, a complicated chemical reaction occurs on the surface of the activated material, and new functional groups such as hydrocarbonyl, amidogen, carboxyl group, and the like are introduced, and these functional groups are all active groups, which can significantly improve the surface activity of the material.

Advantages of atmospheric low temperature plasma cleaning

Plasma cleaning is an important material surface modification method and has been widely used in many fields. Compared with some traditional cleaning methods, such as ultrasonic cleaning, UV cleaning, etc., it has the following advantages:

Low processing temperature

The processing temperature can be as low as 80℃ and below 50 ℃. Low processing temperatures ensure no thermal effects on the sample surface.

No pollution during the whole process

The plasma cleaner itself is a very environmentally friendly device that does not cause any pollution and does not cause any pollution during the treatment process. It can be combined with the original production line to achieve fully automatic online production, saving labor costs.

Stable treatment effect

• The treatment effect of plasma cleaning is very uniform and stable, and the conventional sample maintains good effect for a long time after treatment.
• It can be perfectly matched with automated assembly lines to increase production efficiency
• According to the user’s site requirements, the optimal assembly line production plan is configured to greatly improve production efficiency.

Product principle

The structure of the plasma cleaning machine is mainly divided into three major components, namely high-voltage excitation power supply, plasma generator spray gun, and control system.

High-voltage excitation power supply:

The generation of plasma requires high-voltage excitation, and the atmospheric low-temperature plasma is excited by an intermediate frequency power supply at a frequency of 10-40 kHz. The high voltage is at 4-10KV. The parameters can be adjusted according to the actual conditions of the sample, and the optimal modification effect has been achieved.

Plasma generator spray gun:

The atmospheric low-temperature plasma generator spray gun can be divided into two types: jet flow direct injection and rotary direct injection, the difference is that the treatment area is different.

Control system:

The control system functions is to control the operation of the entire atmospheric low temperature plasma cleaning equipment and the protection of the overall system.

ATMOSPHERIC PLASMA SURFACE TREATMENT INSTRUMENT is an excellent tool for cleaning wafer surface before epitaxial or optical fiber before welding to obtain higher quality. This device also may be used for studying atmosphere pressure CVD.

Atmospheric plasma surface treatment instrument main features:

• High speed surface treatment with simple and safe operation
• Neither vacuum  nor chamber required with versatile plasma chemistry
• Handheld or in-line processing at low cost
• Light weight and compact size

Warranty & Certificate

• One year limited with lifetime support
• CE certified

Application Notes

• This Atmospheric Plasma Jet-Flow system is excellent to clean plastic, polymer and oxide substrate surface before coating
• This device also may be used for studying atmospheric pressure CVD.

Compact UV-Ozone Cleaner proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

UV Lamp

• Solid metal double wave mercury lamp
• UV lamp power: 55W Max.
• Wave length: 254 nm and 185 nm
• UV Lamp service life: 2500 hrs
• UV light area: 100×100 mm ( 4″×4″)
• Peak UV intensities: 4.6 milliwatts/cm2.

Chamber & Sample Stage

• Overall Dimensions:   9 1⁄2” ×7 7/8” ×6”
• Drawer Dimensions:133mm×133mm×25mm
• Distance from drawer to lamp: 27mm
• Distance from pedestal to lamp: 8mm
• Borosilicate Glass Pedestal:  4”×4”×3⁄4”
• 18 Gauge Steel Chassis and Cover, Powder Coated Finish
• Total Weight: 9 lbs.

Environmental Requirement

• Indoor Use Only; Altitude Use Up To 5,562 Feet;
• Temperature Range 41-104 Degrees Fahrenheit;
• Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;
• Main Power Supply Fluctuations Not To Exceed 10% Of The Nominal Voltage; Overvoltage Category II;
• Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

Application:

• Cleaning molecular contamination from SPTs, AFM tips, and surfaces
• Curing UV-adhesives
• UV-photopatterning of SAM surfaces
• Oxidizing PDMS
• Surface sterilization
• Etch, pattern, sharpen
• Clean MEMS devices
• Clean substrate surfaces such as Si, Ge, GaAs and all oxide crystal  substrate

LAB COMPACT UV-OZONE CLEANER WITH 6″×6″ CHAMBER

Lab compact UV-ozone cleaner’s cleaning effect is caused by irradiating the surface of a substrate with suitable lamps creating enough energy in the in the Ultra Violet spectrum range. It is photo-sensitized oxidation process by atomized Oxygen and high reactive Ozone. The UV radiation directly to the surface stimulates the reaction. Volatile hydrocarbon products are produced. The removal of hydrocarbons in nanometer thickness by oxidation results in ultra clean surfaces with significantly wettability. This is very important before thin film coating process of glass and ceramic surfaces.

Lab compact UV-ozone cleaner main features:

• To remove a variety of contaminants from surfaces of substrates samples.
• Use the dry process to clean surfaces with the highly effective method.
• Generate energy at wave line between 254nm to 185nm.
• There are Oxygen inlet port, Ozone removal pump, and LCD display unit.
• Sample temperature measurement feature.
• Buzzer for indicating completion of cleaning.
• Locking feature for locking sample feeding tray to avoid opening during operation.

UV Lamp

• UV lamp power: 120W Max.
• Wave length: 254 nm and 185 nm
• Max substrate size: 150×150 mm (6″×6″)

Chamber & Sample Stage

• Tray size: 176mm×168mm
• Sample feeding: slide based

Applications:

• Cleaning molecular contamination from SPTs, AFM tips, and surfaces
• Curing UV-adhesives
• UV-photopatterning of SAM surfaces
• Oxidizing PDMS
• Surface sterilization
• Etch, pattern, sharpen
• Clean MEMS devices
• Clean substrate surfaces such as Si, Ge, GaAs and all oxide crystal  substrate

The NST Series Plasma Surface Treatment Equipment offers advanced surface treatment for materials like polymers, metals, and semiconductors. It features a 40Khz/13.56MHz RF power supply with auto-matching, multi-layer electrodes for uniform ion distribution, and a dry, low-temperature process suitable for heat-sensitive materials. The system ensures high stability, low energy consumption, and a PLC control system by Siemens. With a compact reaction cavity and precise gas control, it supports complex 3D workpieces without altering material properties.

PLASMA CLEANER 5L

Featrues:

• Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
• Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most.

Applications

• Car industry: ignition coil engine oil seal film
• Defense industry: Aerospace electrical connectors,Kevlar deal
• Electronics industry: hard plastic parts, earphone, Cell phone cover
• Medical industry: intravenous infusion, catheter treatment
• Textile fiber,rubber and plastic industry and etc.

PLASMA CLEANER, also known as plasma surface treatment device, is a new high-tech technology that uses plasma to achieve the results that conventional cleaning methods cannot achieve. Plasma is a state of matter, also called the fourth state of matter, and does not belong to the common three-state of solid-liquid-gas. Applying enough energy to the gas to ionize it becomes a plasma state. The “active” components of the plasma include: ions, electrons, atoms, active groups, excited states of nuclides (metastasis), photons, and the like. Plasma cleaner is to treat the surface of the sample by utilizing the properties of these active components, thereby achieving the purpose of cleaning, coating, etc., improving the surface adhesion of the product, and facilitating the bonding, spraying, printing and sealing of the product.

Low processing temperature

The processing temperature can be as low as 80℃ and below 50 ℃. Low processing temperatures ensure no thermal effects on the sample surface.

No pollution during the whole process

The plasma cleaner itself is a very environmentally friendly device that does not cause any pollution and does not cause any pollution during the treatment process. It can be combined with the original production line to achieve fully automatic online production, saving labor costs.

Stable treatment effect

The treatment effect of plasma cleaning is very uniform and stable, and the conventional sample maintains good effect for a long time after treatment.

70mm rotary spray gun plasma cleaner product principle:

The structure of the plasma cleaner is mainly divided into three major components, namely high-voltage excitation power supply, plasma generator spray gun, and control system.

High-voltage excitation power supply:

The generation of plasma requires high-voltage excitation, and the atmospheric low-temperature plasma is excited by an intermediate frequency power supply at a frequency of 10-40 kHz. The high voltage is at 4-10KV. The parameters can be adjusted according to the actual conditions of the sample, and the optimal modification effect has been achieved.

Plasma generator spray gun:

The atmospheric low-temperature plasma generator spray gun can be divided into two types: jet flow direct injection and rotary direct injection, the difference is that the treatment area is different.

Control system:

The control system functions is to control the operation of the entire atmospheric low temperature plasma cleaning equipment and the protection of the overall system.

ATMOSPHERIC LOW TEMPERATURE PLASMA CLEANER acts on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect, which roughens the surface of the sample and forms many fine pits, increasing the ratio of the sample. Surface, improve the wetting properties of the solid surface.

NST DESKTOP UV OZONE CLEANER has proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

Environment Requirement

• Indoor Use Only; Altitude Use Up To 5,500 Feet;
• Temperature Range 41-104 Degrees Fahrenheit;
• Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;
• Main power supply fluctuations not to exceed 10% of the nominal voltage; overvoltage category II;
• Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

UV   Lamp

• Solid metal double wave mercury lamp
• Wave Length: 253.7nm and 184.9nm
• UV lamp service life: 5000 hrs
• UV light area: 200×200 mm
• Can clean crystal wafer with diameter up to 12“

Chamber & Sample Stage

• Stainless steel case
• Sliding drawer for easy sample loading
• Sample stage area is 310 mm×320 mm (12″×12″ )
• Ozone venting device is built in the chamber
• Timer ranges from 0.01 seconds to 99.9 hours.

Heatable Sample Stage

• Sample stage is heatable up to 150℃ with precision temperature controller
• Temperature controller is 20 segments programmable with +/-2℃ accuracy
• Temperature uniformity:<10℃ within 6 inches diameter area; <20℃ within 12 inches diameter
• Heating rate: 15℃ max.
• The distance between sample stage and lamp is adjustable from 20mm to 40mm.

Vent Port

• 3 in. diameter vent port is built in the back of the machine
• One 10 ft. flexible pipe and one vent clamp are included for connecting the cleaner exhaust to a lab venting system.

Application

• Clean silicon wafer, Gallium Arsenide wafer, quartz and ITO glass
• Clean all types of oxide single crystal substrate such sapphire, STO, and LAO.
• Clean gold and Pt surface
• Oxidizing surface of light metallic material
• Activate Polymers and Crosslink Polymers
• UV Strip Photo Resist / Photoresist
• UV Clean Production Line LED displays

Glass optical plasma cleaner performance advantages:

German circuit technology:

It adopts German high-voltage excitation power circuit technology to generated high-density plasma and ensure superior cleaning results.

Comprehensive security protection:

Temperature safety protection function, overload protection function, air pressure abnormality protection function, short circuit breaking alarm protection function, various misoperation protection functions.

Unique discharge technology:

Special treatment and special structure of the discharge device ensure a stable and uniform plasma.

Production with assembly line:

According to the user’s site requirements, the optimal assembly line production plan is configured to greatly improve production efficiency.

Quality product parts:

All the components of the product are made of top quality parts at home and abroad to ensure superior equipment performance.

Low temperature cleaning:

Meet the temperature requirements of different occasions, no temperature effect on the cleaning products.

Imported precision CNC machine tool processing technology, and equipped with imported three-coordinate measuring instrument for quality monitoring.

PLASMA CLEANING MACHINE EQUIPMENT PRINCIPLE:

ETCHING ON THE SURFACE OF THE MATERIAL – PHYSICAL EFFECT

A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals, act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect to roughen the surface of the sample and form many fine pits, which increases the specific surface of the sample,improves the wetting properties of solid surfaces.

Activation bond energy, cross-linking

The energy of the particles in the plasma is between 0 and 20 eV, and most of the bond energy in the polymer are between 0 and 10 eV. Therefore, after the plasma acts on the solid surface, the original chemical bond on the solid surface can be broken. Free radicals in the plasma form a network of crosslinked structures with these bonds, greatly activating surface activity.

Formation of new functional groups – chemical action

If a reactive gas is introduced into the electric discharge gas, a complicated chemical reaction occurs on the surface of the activated material, and new functional groups such as hydrocarbonyl, amidogen, carboxyl group, and the like are introduced, and these functional groups are all active groups, which can significantly improve the surface activity of the material.

ULTRA-LOW TEMPERATURE ATMOSPHERIC PLASMA CLEANER utilizes the characteristics of plasma to clean, revitalite and activate the surface of solid materials that need to be treated, and the atmospheric plasma cleaner improves the surface adhesion, thereby achieving the purpose of changing the surface microstructure, chemical properties and energy.   Plasma – the fourth state of the material that is not mysterious!   There are solid, liquid, and gaseous substances that we are very familiar with in nature. By continuously providing energy to the substance, the temperature of the substance will rise, and the state of the substance will also be from “solid state→liquid state”, “liquid state→gaseous state”, “gaseous state→plasma state”.   The substance is made up of atoms, which consist of a positively charged nucleus and a negatively charged electron that surrounds the nucleus. When the energy is continuously supplied and heated to a sufficiently high temperature, the outer electrons are detached from the nucleus and become free electrons. This process is called “ionization”; and the substance becomes a positively charged nucleus and a negatively charged electron. Of course, there are also active groups, excited states of nuclides (meta-stable), photons, etc., which are a uniform “paste”, so the plasma is also called plasma. In plasma, the total amount of positive and negative charges is equal, so the overall is electrically neutral, called plasma.   Plasma is a state of high energy instability. Utilizing this high energy and unstable state, plasma has a variety of applications.   Ultra-low temperature atmospheric plasma cleaner principle: Etching on the surface of the material – physical effect A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals, act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect to roughen the surface of the sample and form many fine pits, which increases the specific surface of the sample,improves the wetting properties of solid surfaces.   Activation bond energy, cross-linking The energy of the particles in the plasma is between 0 and 20 eV, and most of the bond energy in the polymer are between 0 and 10 eV. Therefore, after the plasma acts on the solid surface, the original chemical bond on the solid surface can be broken. Free radicals in the plasma form a network of crosslinked structures with these bonds, greatly activating surface activity.   Formation of new functional groups – chemical action If a reactive gas is introduced into the electric discharge gas, a complicated chemical reaction occurs on the surface of the activated material, and new functional groups such as hydrocarbonyl, amidogen, carboxyl group, and the like are introduced, and these functional groups are all active groups, which can significantly improve the surface activity of the material.   Ultra-low temperature atmospheric plasma cleaner structure: Plasma cleaner is mainly composed of two parts: First, the plasma generator is composed of integrated circuit, operation control, plasma generating power source, gas source processing, and safety protection. Second, the plasma processing apparatus is composed of an excitation electrode, an excitation gas path, and the like.   Ultra-low temperature atmospheric plasma cleaner technical advantages: German circuit technology: It adopts German high-voltage excitation power circuit technology to generate high-density plasma and ensure superior cleaning results.   Comprehensive security protection: Over temperature, overload, abnormal air pressure, short circuit, wrong operation, and other comprehensive alarm protection.   Patented discharge technology: Special treatment and special structure of the discharge device, leading atmospheric glow discharge technology.   Great processing width: Solve the problem of large-width sample cleaning, up to 2