Compact UV-Ozone Cleaner

2.50 Lac - 4.50 Lac / Piece

1 Piece (MOQ)

Business Type Manufacturer, Exporter, Supplier
Brand Name NST
Color Blue
Condition New
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Preferred Buyer From

Location Anywhere in India

Product Details

Certification
ISO 9001:2015
Warranty
1year
Country of Origin
India
Input Power
AC 110V or AC 208~240V( You Can Choose as You Needed)
Compliance
CE Certified
UV Lamp Service Life
2500 Hrs
UV Lamp Power
55W Max.
Wave Length
254 nm and 185 nm
Payment Terms
L/C, T/T, Western Union

Compact UV-Ozone Cleaner proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

 

UV Lamp

  • Solid metal double wave mercury lamp
  • UV lamp power: 55W Max.
  • Wave length: 254 nm and 185 nm
  • UV Lamp service life: 2500 hrs
  • UV light area: 100×100 mm ( 4″×4″)
  • Peak UV intensities: 4.6 milliwatts/cm2.

 

Chamber & Sample Stage

  • Overall Dimensions:   9 1⁄2” ×7 7/8” ×6”
  • Drawer Dimensions:133mm×133mm×25mm
  • Distance from drawer to lamp: 27mm
  • Distance from pedestal to lamp: 8mm
  • Borosilicate Glass Pedestal:  4”×4”×3⁄4”
  • 18 Gauge Steel Chassis and Cover, Powder Coated Finish
  • Total Weight: 9 lbs.

 

Environmental Requirement

  • Indoor Use Only; Altitude Use Up To 5,562 Feet;
  • Temperature Range 41-104 Degrees Fahrenheit;
  • Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;
  • Main Power Supply Fluctuations Not To Exceed 10% Of The Nominal Voltage; Overvoltage Category II;
  • Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

 

Application:

  • Cleaning molecular contamination from SPTs, AFM tips, and surfaces
  • Curing UV-adhesives
  • UV-photopatterning of SAM surfaces
  • Oxidizing PDMS
  • Surface sterilization
  • Etch, pattern, sharpen
  • Clean MEMS devices
  • Clean substrate surfaces such as Si, Ge, GaAs and all oxide crystal  substrate

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