NST Dual Head High Vacuum Magnetron Plasma Sputtering Coater

15 Lac - 25 Lac / piece

1 Piece (MOQ)

Business Type Manufacturer, Exporter, Supplier
Brand Name NST
Material Mild Steel
Finishing Polished
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Preferred Buyer From

Location Anywhere in India

Product Details

Driven Type
Electric
Condition
New
Certification
ISO 9001:2015
Voltage
220V
Packaging Type
Wooden Box
Specialities
Rust Proof, Long Life, High Performance, Easy To Operate
Phase
Single Phase
Warranty
1 Year
Country of Origin
India
Input Power
Single Phase 220 V AC 50 / 60 Hz, 2000 W (Including Vacuum Pump and Water Chiller)
Net Weight
160 Kg
Lid Closed Dimension
48 × 28 × 32 Inch
Lid Open Dimension
48 × 28 × 37 Inch
Water Chiller Pump pressure
14 psi
Payment Terms
L/C, T/T, Western Union

NST-DUAL-HEAD HIGH VACUUM MAGNETRON PLASMA SPUTTERING COATER is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc.Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.

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Technical Specifications

Input Power Single phase 220 VAC 50 / 60 Hz, 2000 W (including vacuum pump and water chiller)
Source Power Two sputtering power sources are integrated into one control box
DC source: 500 W power for coating metallic materials
RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials
Magnetron Sputtering Head Two 2″ Magnetron Sputtering Heads with water cooling jackets and shutters are included
One Sputting Head Model also available in this product page (in product options)
One is connected to DC source for coating metallic materials
The other one is connected to RF source for non-conductive materials
Target size requirement: 2″ diameter
Thickness range: 0.1 – 5 mm for both metallic and non-conductive targets (including backing plate)
One Stainless Steel Target target and one Research Grade Al2O3 target are included for demo testing
Customized coater: Two DC heads without RF; two RF heads without DC; 3 RF heads are available upon request
Vacuum Chamber Vacuum chamber: 300 mm Dia. ×300 mm Height, made of stainless steel
Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement
Hinged type lid with pneumatic power pole allows easy target change
Sample Stage Sample holder is a rotatable and heatable stage made of ceramic heater with copper cover
Sample holder size: 140 mm Dia. for. 4″ wafer max
Rotation speed: 1-20 rpm adjustable for uniform coating
The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller
Gas Flow Control Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gasses
Flow rate: 0–200 mL/min adjustable on the touch screen control panel
Air inlet valve is installed for vacuum release
Vacuum Pump Station A mobile pump station is included. The sputtering coater can be placed on top of station
High-speed turbo pump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed
Standard vacuum level connected with chamber : < 4.0E-5 Torr. (1.0E-6 Torr with chamber baking )
Water Chiller One digital temperature controlled recirculating water chiller is included.
Refrigeration range: 5~35 °C
Flow rate: 16 L/min
Pump pressure: 14 psi
Overall Dimensions Lid closed: 48″ × 28″ × 32″
Lid open: 48″ × 28″ × 37″
Net Weight 160 kg
Warranty One years limited warranty with lifetime support

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