Nst 300-2hd Dual Target Magnetron Sputtering Coater

1 Piece (MOQ)

Business Type Manufacturer, Exporter, Supplier
Finishing Polished
Feature Easy To Use, Long Life, Strong Structure, Sturdiness
Type Sputtering Target
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Preferred Buyer From

Location Anywhere in India

Product Details

Country of Origin
India
Model Number
300-2HD
Power Supply Voltage
220V, 50 Hz
Working Vacuum Degree
10-4Pa
The Number of Target Guns
1
RF Sputtering Power
300W / 500W (Optional)
Payment Terms
L/C, T/T, Western Union

300-2HD DUAL TARGET MAGNETRON SPUTTERING COATER is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and ceramic. Film, dielectric film, optical film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.

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Technical Specifications

Name Dual target magnetron sputtering coater
Model 300-2HD
Installation   conditions This   equipment is required to be used at the altitude of 1000m or less, the   temperature of 25℃±15℃,   and the humidity of 55% Rh ± 10% Rh.
1.   Water: The equipment is equipped with a self-circulating chiller (filling   pure water or deionized water)
2.   Electricity: AC220V 50Hz, must have a good ground connection.
3.   Gas: The equipment chamber needs to be filled with argon gas (purity of 99.99% or more). Self-provided argon gas cylinder (with Ø6mm double ferrule   joint) and pressure reducing valve
4.   Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg
5. Ventilation device: need
Main features 1.   Configure two target guns, A matching RF power supply is used for sputter   coating of non-conductive targets, and a matching DC power supply is used for   sputter coating of conductive materials.
2.   It can prepare a variety of films, and has a wide range of applications.
3.   It is small in size and easy to operate.
Technical   parameters 1.   the power supply voltage: 220V 50Hz
2.   rated power: 1200W (excluding vacuum pump)
3.   Working vacuum degree: 10-4Pa
4.   working temperature: RT-500℃, accuracy ± 1×(you can increase the temperature according to actual needs)
5.   the number of target guns: 1
6.   target gun cooling method: water cooling
7.   Target size: Ø2’’, thickness 0.1-5mm (different thickness depending on target   material)
8.   DC sputtering power: 500W (optional)
9.   RF sputtering power: 300W / 500W (optional)
10.   loading sample table: Ø140mm
11.   the sample table speed: adjustable within 1rpm-20rpm
12.   Protective gas: inert gases such as Ar and N2
13.   Intake gas path: mass flow meter controls 2 channels of intake air, flow rate   is 200SCCM
specifications Main   unit size: 500mm × 560mm × 660mm, the whole machine size: 1300mm × 660mm ×   1200mm; weight: 160kg
Standard accessories 1 DC power control system 1
2 RF power control system 1
3 Film   thickness monitor system 1
4 Molecular pump 1
5 Chiller 1
6 Cooling water pipe (Ø6mm) 4
Standard accessories Various targets such as gold, indium, silver, and platinum

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