NST Plasma Magnetron Sputtering Coater

2.50 Lac - 6.50 Lac / piece

1 Piece (MOQ)

Business Type Manufacturer, Exporter, Supplier
Brand Name NST
Material Mild Steel
Finishing Polished
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Preferred Buyer From

Location Anywhere in India

Product Details

Driven Type
220 VAC,50/60 Hz
ISO 9001:2015 Certified
Packaging Type
Wooden Box
Rust Proof, Long Life, High Performance, Easy To Operate
Single Phase
1 Year
Country of Origin
Overall Dimensions
650 mm L x 650 mm W x 1630 mm H
Net Weight
70 Kg
Warranty & Compliance
One Years Limited Warranty with Lifetime Support
Payment Terms
L/C, T/T, Western Union

NST PLASMA MAGNETRON SPUTTERING COATER is an excellent and cost effective coater for coating thin film of non-conductive material in RF plasma magnetron sputtering coater is small in size, occupies less laboratory space, simple in operation and widely used. Therefore, it is widely used in the laboratories of major universities and research institutes.

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Technical Specifications

Input Power 220 VAC, 50/60Hz, single phase
800 W  (including pump)
If the voltage is 110 VAC, a 1000 W transformer is required
Source Power One 13.5 MHz, 300 W RF Generator with automatic matching function is built in cabinet and connected to 2″ sputtering head
Magnetron   Sputtering Head One 2″ Magnetron Sputtering Heads with water cooling jackets are included and inserted into quartz chamber via quick clamp
One shutter is built on the flange (manually operated)
One 16 L/min digitally controlled recirculation water chiller is installed on bottom cabinet for cooling magnetron sputtering heads.
Sputtering   Target Target size requirement: 2″ diameter×1/4″thickness Max
One SiO2 target is included for demo test.
Al2O3 ceramic target Recommend Coating Method
Vacuum   Chamber Vacuum Chamber: 160 mm OD×150 mm ID ×250 mm Height. made of high purity quartz
Sealing Flange: 165 mm Dia. made of Aluminum with high-temperature silicone O-ring
Stainless steel mesh cover is included for 100% shielding RF radiation from chamber
Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump and 1.0E-5 Torr with optional turbo        pump
Sample Holder Sample holder is rotatable and heat-able made of a ceramic heater with stainless steel cover
The sample holder size: 50 mm Dia. for 2″ wafer max
Rotation speed is adjustable: 1-10 rpm for uniform coating
The holder temperature is adjustable from RT to 400°C Max with accuracy +/- 1.0 °C via digital temperature controller.
Vacuum Pump Station KF25 Vacuum port is built in for connecting to a vacuum pump.
Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump

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