NST Dual Target RF Magnetron Sputtering Coater

5.50 Lac - 18.50 Lac / piece

1 Piece (MOQ)

Business Type Manufacturer, Exporter, Supplier
Finishing Polished
Feature Easy To Use, Long Life, Strong Structure, Sturdiness
Country of Origin India
Click to view more

Preferred Buyer From

Location Anywhere in India

Product Details

Model Number
Supply Voltage
AC220V, 50Hz
Total Power
2.5 kW
Max Output Power
RF 300 W
Overall Size
600mm × 650mm × 1280mm
Total Weight
About 300 Kg
Payment Terms
L/C, T/T, Western Union

DUAL TARGET RF MAGNETRON SPUTTERING COATER is equipped with 300W power supply and 500W DC power supply. The DC power supply can be used for the preparation of metal film, and the power supply can be used for the preparation of non-metal films. The two targets can meet the needs of multi-layer coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.


The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.


In addition, this machine is equipped with two high precision film thickness gauges, which can meet the film thickness detection requirements during the coating process. If customers need to install multiple film thickness gauges, also can contact our technical staff for customization.


This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.


Dual-target magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Yes! I am interested

Technical Specifications

Sample stage Size φ185mm Temperature control accuracy ±1℃
Heating temperature Max 500℃ Rotate speed 1-20rpm adjustable
Magnetron Sputtering   target head Quantity 2”×2 (1”,2” optional) Water chiller Circulating water chiller   with flow rate of 10L/min
Cooling mode Water cooling    
Vacuum chamber Chamber size φ300mm×300mm Watch window φ100mm
Chamber material Stainless steel Opening mode Top cover open
Mass flowmeter 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)
Vacuum system Model NST-GZK103-A Pumping interface KF40
Molecular pump NST-600 Exhaust interface KF16
Backing pump rotary vane pump Vacuum measurement Compound vacuum gauge
Ultimate vacuum 1.0E-5Pa Power supply AC;220V 50/60Hz
Pumping rate Molecular pump:   600L/S   rotary vane pump: 1.1L/S
Comprehensive gas pumping performance:   vacuum up to 1.0E-3Pa in 20 minutes
Power configuration Quantity NST power supply×2 Max output power RF 300 W

Looking for "NST Dual Target RF Magnetron Sputtering Coater" ?


Raise your Query

Hi! Simply click below and type your query.

Our experts will reply you very soon.

WhatsApp Us