NST 5 Heads RF Plasma Magnetron Sputtering Coater Machine

1 Piece (MOQ)

Business Type Manufacturer, Exporter, Supplier
Brand Name NST
Material Mild Steel
Finishing Polished
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Preferred Buyer From

Location Anywhere in India

Product Details

Driven Type
Electric
Color
Blue
Condition
New
Certification
ISO 9001:2015
Voltage
220V
Specialities
Rust Proof, Long Life, High Performance, Easy To Operate, Ruggedly Constructed,Less Maintenance
Phase
Single Phase
Warranty
1 Year
Country of Origin
India
Net Weight
60 Kg
Input Power
220 VAC, 50 / 60 Hz
Wattage
1000 W (including vacuum pump and water chiller)
Payment Terms
L/C, T/T, Western Union

CUSTOMIZED 5 HEADS NST PLASMA MAGNETRON SPUTTERING COATER is particularly suitable for exploring solid electrolyte materials, combined by 5 different elements in 16 different ratios.This equipment is mainly used to make an oxide film on a single crystal substrate, so there is no need for a high vacuum environment.

 

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Details

Features 5 magnetron sputtering guns for 5 different target materials
Depending on the power supplies used (RF or DC), both metallic and non-metallic materials can be deposited.
Capable of sputtering 5 target materials to produce various  compositions via different sputtering times / rates
With optional 5 power supplies, 5 target materials can be sputtered at the same time for combinatorial sputtering
16 samples can be deposited in one batch with a mask and a rotating sample holder
Input Power Single phase 220 VAC, 50 / 60 Hz
1000 W (including vacuum pump and water chiller)
Power Source One 13.5 MHz,300 W auto-match RF generator is included and connected to the sputtering heads
The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” without breaking of vacuum during a multilayer process.
Multiple RF power supplies are optional, which allows user to sputter multi-target at the same time for combinatorial sputtering
Laptop with control software is available at extra cost to control each RF gun’s sputtering time and power
Magnetron   Sputtering Head Five 1″ magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps
One manually operated shutter is built on the flange
One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads
Sputtering   Target Target size requirement: 1″ diameter×1/8″ thickness max
Sputtering distance range: 50 – 80 mm adjustable
Sputtering angle range: 0 – 25° adjustable
1″ diameter Cu target and Al2O3 target are included for demo testing
Vacuum Chamber
 
Vacuum chamber is made of 304 stainless steel with reinforcing rib
Inside vacuum chamber size: 470 mm L×445 mm D×522 mm H  (~105 Liters, 18.5“×17.5″× 20.5″)
Round 380 mm Dia. hinged type door with 150 mm Dia glass window
Temperature range: -15 to 150 °C
Vacuum level: 4.0E-5 torr with turbo pump
Sample Holder
 
150 mm diameter rotatable sample holder for coating 16 sample one one batch with different compositions
Sample holder and mask rotation can be controlled manually by a button or automatically by a control software (Optional)
The sample holder temperature is adjustable from RT to 600 °C max
Vacuum Pump KF40 vacuum port is built in for connecting to a vacuum pump.
A compact turbo pump is included
4.0E-5 Torr with optional turbo pump

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