Nst Electron Beam Evaporation Coating System

1 Piece (MOQ)

Business Type Manufacturer, Exporter, Supplier
Driven Type Electric
Color Blue
Condition New
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Preferred Buyer From

Location Anywhere in India

Product Details

Certification
ISO 9001:2015
Voltage
220V
Warranty
1year
Country of Origin
India
Structure
U-box Front Opening Vacuum Chamber, Rear-mounted Pumping System
Vacuum Chamber
500×500×600mm2
Vacuum System Configuration
Compound Molecular Pump, Mechanical Pump, Gate Valve
Ultimate Pressure
≤6. 67×10-5Pa (After Baking and Degassing)
Gas Circuit System
1-Circuit 200SCCM Mass Flow Controller
Quartz Crystal Oscillation Film Thickness Controller
Thickness Monitoring Range: 0~99u9999A;
Payment Terms
L/C, T/T, Western Union

ELECTRON BEAM EVAPORATION COATING SYSTEM is used for preparing conductive film, semiconductor film, ferroelectric film, optical film, etc. It is widely used in colleges and universities, scientific research institutions and small batch production.

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Technical Specifications

Structure U-box front opening vacuum chamber, rear-mounted pumping system
Vacuum chamber 500×500×600mm2
Vacuum system configuration Compound molecular pump, mechanical pump, gate valve
Ultimate pressure
 
≤6. 67×10-5Pa (after baking and degassing)
Vacuum recovery system It can reach 6.67×10-4pa in 45 minutes (after the system is exposed to the   atmosphere for a short time and is filled with dry nitrogen)
Electron beam evaporation source E type electron gun Anode voltage: 6kv、8kv;
Quantity (set) 1
Crucible Water-cooled crucible, four point design, each capacity of 11ml
Power 0~6 KW adjustable
Resistance evaporation source (optional) Voltage 5, 10V
Power Current 300A,the maximum output 3kw
Quantity One set, Switchable
Water cooling electrode Three roots, make up two evaporation boats
Type and size of workpiece frame Substrate size:  compatible with 4″substrate
Max substrate   heating temperature 800℃±1℃
Substrate rotates continuously, rotation speed:5-60 rpm
The distance between the substrate and the evaporation source is adjustable from 300 to   350mm
Manually controlled sample baffle   assembly: 1 set
Gas circuit   system 1-circuit 200SCCM mass flow controller
Quartz crystal oscillation film thickness controller Thickness monitoring range: 0~99u9999A;
Space occupied Main Set 900×800mm2
Electrical   Cabinet 800×800mm2 (two)

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